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Decontamination of Chamber and Sample

PIE Scientific

The PIE Scientific KLEEN Series remote plasma cleaners were based on the high efficiency inductively coupled plasma (ICP) discharge technology developed at the Lawrence Berkeley National Laboratory.
 
Their patent pending Turbo Discharge™ technology further improves the plasma strength by as much as 3x compared with traditional ICP discharge technology.

 
Contamination
PIE Scientific EM-KLEEN Downstream Plasma CleanerThe quality of images created in Electron Microscopes is often degraded by residual amounts of hydrocarbons present in the vacuum chamber. In additional to the electron column system, the sources of these problematic molecules can include the specimen mounts, holders or even the specimens themselves.
 
Cleaning
The PIE Scientific EM-KLEEN De-Contaminator allows users to clean the chamber and samples, removing hydrocarbons by the proven downstream plasma ashing process. The Evactron System is not a “plasma cleaner” in the usual sense. Traditional plasma cleaning systems sputter etch with energetic ion species, possibly damaging sensitive sample surfaces with heat and ion bombardment.
The EM-KLEEN chemically etches surfaces using reactive gas radicals produced by the RF generated plasma. It preserves critical sample fine structure. The hydrocarbon contamination is broken down and easily removed by the system vacuum pump.
 

unwanted artefacts

unwanted artefacts

after plasma cleaning

after plasma cleaning

 
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