The quality of images created in Electron Microscopes is often degraded by residual amounts of hydrocarbons present in the vacuum chamber. In additional to the electron column system, the sources of these problematic molecules can include the specimen mounts, holders or even the specimens themselves.
The PIE Scientific EM-KLEEN De-Contaminator allows users to clean the chamber and samples, removing hydrocarbons by the proven downstream plasma ashing process. The Evactron System is not a “plasma cleaner” in the usual sense. Traditional plasma cleaning systems sputter etch with energetic ion species, possibly damaging sensitive sample surfaces with heat and ion bombardment.
The EM-KLEEN chemically etches surfaces using reactive gas radicals produced by the RF generated plasma. It preserves critical sample fine structure. The hydrocarbon contamination is broken down and easily removed by the system vacuum pump.