GV10x Downstream Asher with patented plasma source   In cooperation with the German general agency “FIB” we present the plasma systems of the “ibss Group, Inc.” (USA). Competitively priced the GV10x Downstream Asher reduces carbon & hydrocarbon contamination in SEM-, TEM-, FIB-SEM- and other vacuum chambers about 10 to 20 times more effectively than traditional methods.   Typical GV10x DS plasma is driven with air/oxygen to oxidize hydrocarbon contaminates. Results from experiments are showing that DS hydrogen plasma is effective and safe for removing carbon deposits on multilayer mirrors.    The ibss Group GV10x downstream asher can be used on several laboratory instruments, and not be confined to one. The downstream process, frequently called remote process, unlike usual plasma cleaners, does not produce kinetic impingement, sputter damage, or sample heating. ibss Group Gentle Asher, with a GV10x and pump extends the downstream process to pre-cleaning specimens and TEM holders. Pre-cleaning specimens and holders before moving into the EM, prolongs the frequency necessary to clean microscope chambers.     specifications GV10x Power Supply 100 - 230 VAC, 50 / 60 Hz RF Generator 13.56 MHz RF Power 10 - 99 Watts Vacuum Range 2 Torr to < 5 mTorr Mounting Flange DIN KF40 Dimensions (H,W,D) 172 x 203 x 432 mm Weight 7.25 kg GA10x Gentle Asher™ Chamber for samples and sampleholders   ibss Group, Inc. introduced the Gentle Asher™ to extend the GV10x investment to cleaning specimens before insertion into the EM chamber.  The Gentle Asher™ Chamber with a GV10x connected, GA/GV, is well suited for preventing black scan square buildup.   After de-contaminating an EM chamber to acceptable HC levels, one can utilize the DS process for sample cleaning and storage by simply moving the GVx Source onto the Gentle Asher Chamber. Reports from customers claim this cost effective combination delicately removes contamination from TEM holders and any type sample with less damage while keeping HC levels manageable in CDSEM, SEM, FIB-SEM and TEM. Pre-cleaning samples and holders prevents contaminating the chamber gas phase that prolongs time between microscope cleanings. The delicate oxidative removal of HCs is a welcomed solution to university, industrial and commercial electron microscopy labs to eliminate black scan squares. The DS process has been found effective in lowering HC contamination levels that cause critical measurement errors at high magnification and low landing energies in FE-SEM, TEM, and FIB-SEMs.