VELA Focused Ion Beam W-REM

Focused Ion Beam W-SEM

Scanning Electron Microscope with an Extra Large Chamber and Variable Pressure SEM Operation.

 

A unique four-lens Wide Field Optics™ design offering the variety of working and displaying modes embodying the Tescan proprietary Intermediate Lens for the beam aperture optimization

 

Fast imaging rate, using first class YAG detectors

 

Variable pressure mode (UniVac model) for observation of nonconductive specimens in their natural uncoated state

 

Fully automated microscope set-up including electron optics set-up and alignment.

 

Live stereoscopic imaging for accurate 3D navigation

 

Network operations and built-in remote access/diagnostics, all come as a Tescan standard

 

Five-axis fully motorized compucentric stage with extra wide range of movements
 

FIB Specific Features

 

Unique ion optic column differentially pumped, with 2 ion pumps, for ultra-low ion scattering effect

 

Motorized aperture changer with ultra-high reproducibility

 

Beam Blanker and Faraday cup included as a standard

 

Simultaneous SEM imaging with FIB etching or deposition

 

FIB control is fully integrated in the SEM software

 

Powerful toolbox for basic shapes creation with programmable process parameters
 

GIS Option Features

 

Ideal geometrical configuration with respect to SEM and FIB columns

 

5 independent gas reservoirs with capillaries

 

3-axis microstage with automatic nozzles positioning

 

Automated temperature control
 
Standard gases for GIS (other gasses on request):

 

Tungsten metal deposition

 

Platinum metal deposition

 

Insulator (SiOx) deposition

 

Enhanced etching of diamond and PMMA (H2O)

 

Enhanced or selective etching of Si, SiOx, Si3N4, W (XeF2)